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Volumn 355, Issue 22-23, 2009, Pages 1240-1245

Influence of Ar/C2H2 ratio on the structure of hydrogenated carbon films

(3) Marcinauskas, Liutauras a,b Grigonis, Alfonsas b Valincius, Vitas a

a LITHUANIAN ENERGY INSTITUTE (Lithuania)

b KAUNAS UNIVERSITY OF TECHNOLOGY (Lithuania)

Author keywords

Carbon; Chemical vapor deposition; Diamond like carbon; Films and coatings; FTIR measurements; Microscopy; Plasma deposition; Scanning electron microscopy

Indexed keywords

ABSORPTION PEAKS; AMORPHOUS HYDROGENATED CARBON FILMS; DIAMOND-LIKE CARBON; FILMS AND COATINGS; FTIR MEASUREMENTS; GAS VOLUME; HYDROGENATED CARBON FILMS; MICROSCOPY; SI (1 1 1); SURFACE POROSITY;

AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COATINGS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS ABSORPTION; HARDENING; HYDROGENATION; LITHIUM COMPOUNDS; PLASMA DEPOSITION; PLASMA JETS; PLASMAS; SCANNING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; VAPORS;

CARBON FILMS;

EID: 67649108953 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2009.05.009 Document Type: Article

Times cited : (15)

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