A model for the deposition of a-C:H using an expanding thermal arc

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1584-1589

  Kessels, W M M ^a   Gielen, J W A M ^a   Van De Sanden, M C M ^a   Van Ijzendoorn, L J ^a   Dekempeneer, E H A ^b   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Vlaamse Instelling voor Technologisch Onderzoek (VITO) Boeretang 200   (Belgium)

Author keywords

a C:H; Deposition; Growth model; Substrate temperature

Indexed keywords

EID: 0006044742     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00358-7     Document Type: Article

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