Diamond synthesis with a DC plasma jet: Control of the substrate temperature

Diamond and Related Materials

Volumn 9, Issue 3-6, 2000, Pages 333-336

  Breiter, M ^a   Doppleb, C ^a,b   Weiss K H ^a   Nutsch, G ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b OSRAM GMBH   (Germany)

Author keywords

DC plasma chemical vapor deposition; Diamond films; Morphology; Temperatures

Indexed keywords

ATOMIZATION; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; PLASMA TORCHES; SILICON WAFERS; SYNTHETIC DIAMONDS; TEMPERATURE CONTROL; THERMAL EFFECTS; VACUUM APPLICATIONS; VAPORIZATION; WATER;

VACUUM CHAMBERS;

DIAMOND FILMS;

DIAMOND COATING; MORPHOLOGY; PLASMA JET; TEMPERATURE; VAPOR DEPOSITION;

EID: 0034124179     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00335-0     Document Type: Conference Paper

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