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Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 503-508

Amorphous hydrogenated carbon films deposited by PECVD: Influence of the substrate temperature on film growth and microstructure

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CARBON; ELECTRIC POTENTIAL; FILM GROWTH; HIGH TEMPERATURE EFFECTS; HYDROGENATION; ION BOMBARDMENT; METHANE; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERS; RAMAN SPECTROSCOPY; STRESS ANALYSIS; SURFACE ROUGHNESS;

EID: 2942587017     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.03.029     Document Type: Conference Paper
Times cited : (14)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.