|
Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 503-508
|
Amorphous hydrogenated carbon films deposited by PECVD: Influence of the substrate temperature on film growth and microstructure
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ARGON;
ATOMIC FORCE MICROSCOPY;
CARBON;
ELECTRIC POTENTIAL;
FILM GROWTH;
HIGH TEMPERATURE EFFECTS;
HYDROGENATION;
ION BOMBARDMENT;
METHANE;
MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYMERS;
RAMAN SPECTROSCOPY;
STRESS ANALYSIS;
SURFACE ROUGHNESS;
HYDROGEN DILUTION;
SUBSTRATE TEMPERATURE;
SURFACE MOBILITY;
AMORPHOUS FILMS;
|
EID: 2942587017
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2004.03.029 Document Type: Conference Paper |
Times cited : (14)
|
References (15)
|