Kinetic simulation of debris from an LPP EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Rollinger, Bob ^a   Giovannini, Andrea ^a   Bleiner, Davide ^a   Chokani, Ndaona ^a   Abhari, Reza S ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Atomic physics; Computational; EUV source; Hydrodynamics; Laser plasma; Lithography

Indexed keywords

COMPUTATIONAL; CONTINUOUS OPERATION; EUV SOURCE; EXPERIMENTAL VALUES; FAR FIELD; FAST IONS; ION DISTRIBUTIONS; ION FLUXES; ION KINETIC ENERGY; KINETIC SIMULATION; LASER PLASMA; LIFE-TIME; LOCAL TIME; METER SCALE; MICROMETER SCALE; MITIGATION SCHEMES; NEAR-FIELD; NONUNIFORMITY; NORMAL INCIDENCE; ORDER OF MAGNITUDE; PARTICLE DYNAMICS; PLASMA EXPANSION;

ATOMS; CONVERSION EFFICIENCY; DEBRIS; DROPS; FLUID DYNAMICS; HYDRODYNAMICS; IONS; KINETIC ENERGY; LASER BEAMS; LASER PRODUCED PLASMAS; LASERS; MIRRORS; OPTICS; PLASMA INTERACTIONS; TIN; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149133753     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814150     Document Type: Conference Paper

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