Parametric tradeoffs in laser plasma sources for EUV lithography: Debris versus radiators

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Bleiner, Davide ^a   Rollinger, Bob ^a   Abhari, Reza S ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Cost of ownership; Debris; Energy conversion efficiency; EUV source; Laser plasma; Laser technology; Lithography

Indexed keywords

ANGULAR DISPERSIONS; ATOMIC DEGREES OF FREEDOM; BOW SHOCKS; COST OF OWNERSHIP; ELECTRONIC CONFIGURATION; EUV EMISSIONS; EUV SOURCE; FAST IONS; HIGH LASER POWER; INTERNAL DEGREES OF FREEDOM; LASER PLASMA; LASER TECHNOLOGY; LASER-PLASMA INTERACTIONS; LASER-PLASMA SOURCE; LENGTH SCALE; LOW ENERGIES; PLUME EXPANSION; PRIMARY IONS; RADIATION FLUXES; SHADOWGRAPHY; SOLID ANGLE; SOLID TARGETS; TIME-RESOLVED; TIME-SCALES; TRANSPORT PROCESS; VIABLE SOLUTIONS; WORST CASE SCENARIO;

ASPECT RATIO; BEAM PLASMA INTERACTIONS; CONVERSION EFFICIENCY; EXTREME ULTRAVIOLET LITHOGRAPHY; IONS; LASER BEAMS; LASER PRODUCED PLASMAS; LIGHT SOURCES; MASS SPECTROMETRY; MECHANICS; RADIATORS;

DEBRIS;

EID: 79959345119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772613     Document Type: Conference Paper

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