Thermal management design and verification of collector optics into high power EUV source systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Bianucci, Giovanni ^a   Zocchi, Fabio E ^a   Pirovano, Giorgio ^a   Cassol, Gian Luca ^a   Marioni, Fabio ^a   Binda, Pietro ^a   Porreca, Luca ^b   Ahmad, Imtiaz ^c   Bolshukhin, Denis ^c   Schürmann, Max C ^c  

^a Media Lario Technologies   (Italy)

^b ETH ZURICH   (Switzerland)

^c XTREME Technologies GmbH   (Germany)

Author keywords

Collection efficiency; Collector; Extreme ultra violet lithography; Thermal management

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; PLASMAS; PRODUCTIVITY; TEMPERATURE CONTROL; VACUUM;

COLLECTION EFFICIENCY; COLLECTOR OPTICS; GAS DISCHARGE PRODUCED PLASMAS (GDPP);

MIRRORS;

EID: 35148813531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712241     Document Type: Conference Paper

References (13)

1. H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groeneveld, H.-J. Voorma, U. Mickan, B. Wolschrijn, B. Mertens, G. van Baars, P. Kürz, N. Hamed, "First performance results of the ASML alpha demo tool," Proc. SPIE 6151, 49-60 (2006).
2. H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, K. Murakami, "Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA),"Proc. SPIE 5751, 102-109 (2005).
3. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, Y. Ohkubo, T. Asami, "Nikon EUVL development progress summary," Proc. SPIE 6151, 20-29 (2006).
4. th Sematech EUVL Symposium, San Diego, CA, 7-9 Nov. 2005.
5. th Sematech EUVL Symposium, San Diego, CA, 7-9 Nov. 2005.
6. A. Miyake, K. Kanazawa, V. Banine, K. Suzuki, "Update on joint EUV source requirements," Sematech EUV Source Workshop, Barcelona, Spain, 19 Oct. 2006.
7. U. Stamm, J. Kleinschmidt, D. Bolshukhin, J. Brudermann, G. Hergenhan, V. Korobotchko, B. Nikolaus, M.C. Schürmann, G. Schriever, C. Ziener, V. M. Borisov, "Development status of EUV sources for use in Beta-tools and high-volume chip manufacturing tools," Proc. SPIE 6151, 61510O (2006).
8. H. Wolter, "Mirror systems with glancing incidence as image-producing optics for X-rays," Ann. Phys. 10, 94-114 (1952).
9. J.K. Silk, "A grazing incident microscope for x-ray imaging applications," Annuals N.Y. Academy Sciences 342, 116-129 (1980).
10. F.E. Zocchi, E. Buratti, V. Rigato, "Design and optimization of collectors for extreme ultra-violet lithography," Proc. SPIE 6151, 61510T (2006).
11. O. Citterio, G. Bonelli, G. Conti, E. Mattaini, E. Santambrogio, B. Sacco, E. Lanzara, H. Brauninger, and W. Burkert, "Optics for the X-ray imaging concentrators aboard the x-ray astronomy satellite SAX," Appl. Opt. 27, 1470-1475 (1988).
12. D. de Chambure, R. Lainé, K. v. Katwijk, J. v. Casteren, P. Glaude, "The status of X-Ray mirror production for the ESA XMM spacecraft," Proc. SPIE 2008, 362-375 (1996).
13. R. Hudec, L. Pina, A. Inneman, "Replicated grazing incidence X-ray optics: past present and future," Proc. SPIE 3766, 62-71 (1999).