Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2879-2884

  Takenoshita, K ^a   Koay, C S ^a   George, S ^a   Teerawattansook, S ^a   Richardson, M ^a   Bakshi, V ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION EMISSION; ION ENERGY DISTRIBUTIONS; MIRROR EROSION; MIRROR REFLECTIVITY;

ELECTRIC FIELDS; ION BEAMS; LIGHT EMISSION; LIGHT REFLECTION; MIRRORS; PLASMA DIAGNOSTICS; PLASMAS; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 29044440859     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2131879     Document Type: Article

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