Analysis of carbon deposition on multilayer mirrors by using two different beamlines

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Nakayama, Takahiro ^a   Miyake, Akira ^a   Takase, Hiromitsu ^a   Terashima, Shigeru ^a   Sudo, Takashi ^a   Watanabe, Yutaka ^a   Fukuda, Yasuaki ^a  

^a Canon 23 10   (Japan)

Author keywords

Carbon; Contamination; EUV lithography; EUV optics; Multilayer mirrors

Indexed keywords

BEAM-LINES; CARBON DEPOSITION; EUV LITHOGRAPHY; EUV OPTICS; EUV SOURCE; EXPOSURE TOOL; MULTILAYER MIRRORS; RESEARCH AND DEVELOPMENT; SYNCHROTRON RADIATION FACILITY;

DEPOSITION; DEPOSITION RATES; ELECTROMAGNETIC WAVES; EXTREME ULTRAVIOLET LITHOGRAPHY; HYDROCARBONS; LIGHT SOURCES; MIRRORS; MULTILAYERS; SYNCHROTRON RADIATION; SYNCHROTRONS;

ULTRAVIOLET DEVICES;

EID: 67149119569     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813587     Document Type: Conference Paper

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