Modeling carbon contamination of extreme ultraviolet (EUV) optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 675-685

  Hollenshead, Jeromy T ^a   Klebanoff, Leonard E ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Extreme ultraviolet lithography; Hydrocarbon contamination modeling; Hydrocarbon cracking

Indexed keywords

AMORPHOUS MATERIALS; CARBON; CHEMICAL BONDS; COMPUTER SIMULATION; CONTAMINATION; CROSSLINKING; DEGRADATION; FILM GROWTH; HYDROCARBONS; HYDROCRACKING; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; HYDROCARBON CONTAMINATION MODELING; HYDROCARBON CRACKING;

LITHOGRAPHY;

EID: 3843086086     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537471     Document Type: Conference Paper

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