Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Kakutani, Yukinobu ^a   Niibe, Masahito ^a   Gomei, Yoshio ^b   Takase, Hiromitsu ^c   Terashima, Shigeru ^c   Matsunari, Shuichi ^c   Aoki, Takashi ^c   Fukuda, Yasuaki ^c  

^a UNIVERSITY OF HYOGO   (Japan)

^b CANON INC   (Japan)

^c Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

Contamination; EUVL; Multilayer mirror; Radiation damage; Reflectance

Indexed keywords

CONTAMINATION; DURABILITY; EXTREME ULTRAVIOLET LITHOGRAPHY; MIRRORS; RADIATION DAMAGE; REFLECTION; RUTHENIUM;

CAPPING LAYERS; MULTILAYER MIRRORS; REFLECTANCE DEGRADATION;

MULTILAYERS;

EID: 35148833070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711364     Document Type: Conference Paper

References (10)

1. S. Bajt, H. N. Chapman, N. Nguyen, J. Alameda, J. C. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio and S. Grantham, Proc. SPIE, 5037 (2003), 236.
2. Y. Kakutani, M. Niibe, Y. Gomei, H. Takase, S. Terashima, S. Matsunari, T. Aoki, K. Murakami and Y. Fukuda, Proc. SPIE, 6151 (2006), 61510H.
3. H. Meiling, B. Mertens, F. Stietz, M. Wedowski, R. Klein, R. Kurt, E. Louis and A. Yakshin, Proc. SPIE, 4506 (2001), 93.
4. N. Koster, B. Mertens, R. Jansen, A. van de Runstraat, F. Stietz, M. Wedowski, H. Meiling, R. Klein, A. Gottwald, F. Scholze, M. Visser, R. Kurt, P. Zalm, E. Louis and A. Yakshin, Microelectron. Eng. 61-62 (2002), 65.
5. L. E. Klebanoff, W. M. Clift, M. E. Malinowski, C. Steinhaus, P. Grunow and S. Bajt, J. Vac. Sci. Technol., B 20 (2002), 696.
6. L. E. Klebanoff, P. A. Grunow, S. Graham, W. M. Clift, A. H. Leung and S. J. Haney, Proc. SPIE, 4688 (2002), 310.
7. S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson and N. V. G. Edwards, Proc. SPIE, 5751 (2005), 118.
8. S. B. Hill, I. Ermanoski, S. Grantham, C. Tarrio, T. B. Lucatorto, T. E. Madey, S. Bajt, M. Chandhok, P. Yan, O. Wood, S. Wurm and N. V. Edwards, Proc. SPIE, 6151 (2006), 61510F.
9. H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groenveld, H. Voorma, U. Michan, B. Wolschrijn, B. Mertens, G. Baars, P. Kürz and N. Harned, Proc. SPIE, 6151 (2006), 615108.
10. M. Niibe, Y. Kakutani, S. Terashima, H. Takase, Y. Gomei, S. Matsunari, T. Aoki, K. Murakami and Y. Fukuda, Jpn. J. Appl. Phys., 45 (2006), 5373.