Phenomenological analysis of carbon deposition rate on the multilayer mirror

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Nakayama, Takahiro ^a   Takase, Hiromitsu ^a   Terashima, Shigeru ^a   Sudo, Takashi ^a   Watanabe, Yutaka ^a   Fukuda, Yasuaki ^a   Murakami, Katsuhiko ^a   Kawata, Shintaro ^a   Aoki, Takashi ^a   Matsunari, Shuichi ^a   Kakutani, Yukinobu ^a   Niibe, Masahito ^b  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Carbon deposition; Contamination; EUV lithography; EUV optics; Multilayer mirror

Indexed keywords

BEAM LINES; CARBON DEPOSITION; EUV OPTICS; EXPOSURE TOOL; HYDROCARBON SPECIES; MULTI-LAYER MIRRORS; MULTILAYER MIRROR; ORGANIC SPECIES; PHENOMENOLOGICAL ANALYSIS; RESEARCH AND DEVELOPMENT; SYNCHROTRON RADIATION FACILITY; UNIVERSAL FUNCTIONS;

DEPOSITION RATES; EXTREME ULTRAVIOLET LITHOGRAPHY; HYDROCARBONS; IRRADIATION; MIRRORS; MULTILAYERS;

DEPOSITION;

EID: 67149083111     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.769958     Document Type: Conference Paper

References (9)

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