Study of Ruthenium-capped multilayer mirror for EUV irradiation durability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Takase, Hiromitsu ^a   Terashima, Shigeru ^a   Gomei, Yoshio ^a   Tanabe, Masayuki ^a   Watanabe, Yutaka ^a   Aoki, Takashi ^a   Murakami, Katsuhiko ^a   Matsunari, Shuichi ^a   Niibe, Masahito ^b   Kakutani, Yukinobu ^b  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Capping layer; EUVL; Mo Si; Multilayer; Ru; Structure

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DIFFUSION; MULTILAYERS; RUTHENIUM; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

CAPPING LAYERS; EUVL; MO/SI; STRUCTURES;

MIRRORS;

EID: 33745633824     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657089     Document Type: Conference Paper

References (3)

1. Sasa Bajt, ZuRong Dai, Giles A. Graham, Jennifer Alameda, Sherry Baker, Nhan Nguyen, Cheryl Evans, Art J. Nelson, John S. Taylor, Miles Clift, Dean Buchenauer, Andy Aquila, Eric M. Gullikson, N.V. Ginger Edwards, Stefan Wurm and Obert Wood, "Screening of oxidation resistant capping layers for EUV multilayers", EUVL symposium Co07 (2004)
2. Sasa Bajt, ZuRong Dai, Erik J. Nelson, Mark A. Wall, Jennifer Alameda, Nhan Nguyen, Sherry Baker, Jeffrey C. Robinson, John S. Taylor, Miles Clift, Andy Aquila, Eric M. Gullikson, and N. V. Ginger Edwards, "Oxidation resistance of Ru-capped EUV multilayers", Proc. SPIE Vol. 5751, pp118-127 (2005)
3. S. B. Hill, C. Tarrio and T. B. Lucatorto, D. Buchenauer, L. E. Klebanoff and W. M. Clift, S. Bajt, O. Wood II, S. Wurm and N. V. Edwards, "EUV and e-beam irradiations of Ru-capped multilayer mirrors", EUVL symposium Co08 (2004)