Multi-purpose optical profiler for characterization of materials, film stacks and for absolute topography measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7272, Issue , 2009, Pages

  De Lega, X Colonna ^a   Fay, Martin ^a   De Groot, Peter ^a   Kamenev, Boris ^b   Ryan Kruse, J ^a   Haller, Mitch ^a   Davidson, Mark ^c   Miloslavsky, Lena ^d   Mills, Duncan ^d  

^a ZYGO CORPORATION   (United States)

^b Zygo Corporation   (United States)

^c Spectel Research Corp   (United States)

^d WESTERN DIGITAL CORPORATION   (United States)

Author keywords

Interference microscopy; Material characterization; Thin films; Topography; White light

Indexed keywords

AFM; ANGLES OF INCIDENCE; CRITICAL LAYER THICKNESS; DATA STORAGE INDUSTRY; DUAL MODES; FILM EFFECTS; INTERFERENCE MICROSCOPY; MATERIAL CHARACTERIZATION; MODES OF OPERATION; MULTI-PURPOSE; OBJECT SURFACE; OPTICAL PROFILER; POLARIZATION STATE; SPOT SIZES; STEP HEIGHT; TOPOGRAPHY MEASUREMENT; WHITE LIGHT INTERFERENCE; WHITE-LIGHT;

ENGINEERING GEOLOGY; MATERIALS; MEASUREMENTS; OPTICAL PROPERTIES; PROCESS CONTROL; SURFACE TOPOGRAPHY; THIN FILMS;

OPTICAL FILMS;

EID: 66649131053     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814629     Document Type: Conference Paper

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