Characterization of materials and film stacks for accurate surface topography measurement using a white-light optical profiler

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6995, Issue , 2008, Pages

  Colonna De Lega, X ^a   De Groot, Peter J ^a  

^a ZYGO CORPORATION   (United States)

Author keywords

Interference microscopy; Material characterization; Thin films; Topography; White light

Indexed keywords

COMPUTER NETWORKS; ENGINEERING GEOLOGY; MAPS; MEASUREMENTS; MICROSYSTEMS; OPTICAL PROPERTIES; OPTICS; PIGMENTS; REFRACTIVE INDEX; SCANNING; SEMICONDUCTING CADMIUM TELLURIDE; STANDARDS; STEREOCHEMISTRY; SURFACE TOPOGRAPHY; SURFACES; TECHNOLOGY; THICK FILMS; THICKNESS MEASUREMENT; THIN FILMS; TOPOGRAPHY;

(1 1 0) SURFACE; (PL) PROPERTIES; ANGLE OF INCIDENCE; COMPLEX OBJECTS; LAYER THICKNESSES; LAYERED STRUCTURED; MICRO SYSTEMS TECHNOLOGY (MST); NANO-METROLOGY; OBJECT SURFACE; OPTICAL (PET) (OPET); OPTICAL PROFILER; THREE-DIMENSIONAL (3D) TOPOGRAPHY; TOPOGRAPHY MEASUREMENTS; WHITE LIGHT; WHITE LIGHT INTERFEROMETRY (WLI);

FILM THICKNESS;

EID: 45149085908     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.782836     Document Type: Conference Paper

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