Alkyl self-assembled monolayer prepared on hydrogen-terminated Si(111) through reduced pressure chemical vapor deposition: Chemical resistivities in HF and NH4F solutions

Chemistry Letters

Volumn , Issue 12, 2002, Pages 1194-1195

  Saito, Nagahiro ^a   Youda, Satoko ^a   Hayashi, Kazuyuki ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM FLUORIDE; HYDROFLUORIC ACID; HYDROGEN; SILICON;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL PARAMETERS; PRESSURE; VAPOR;

EID: 0037028340     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2002.1194     Document Type: Article

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