Modeling of roughness evolution during the etching of inhomogeneous films: Material-induced anomalous scaling

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 79, Issue 4, 2009, Pages

  Constantoudis, V ^a   Christoyianni, H ^a   Zakka, E ^a   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ANOMALOUS SCALING; DIAGNOSTIC TOOLS; INHOMOGENEITIES; INHOMOGENEOUS FILMS; KINETIC ROUGHENING; MODEL RESULTS; ROUGHNESS EVOLUTION; SIMPLE MODELING; SQUARE-ROOT; UNIVERSALITY CLASS;

ETCHING; FILLERS;

COMPOSITE FILMS;

EID: 66049099369     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.79.041604     Document Type: Article

References (26)

1. A.-L. Barabasi and H. E. Stanley, Fractal Concepts in Surface Growth (Cambridge University Press, Cambridge, England, 1995).
2. J. Krug, Adv. Phys. 46, 139 (1997). 10.1080/00018739700101498
3. R. Cuerno, M. Castro, J. M. García, R. Gago, and L. Vázquez, Eur. Phys. J. Spec. Top. 146, 427 (2007). 10.1140/epjst/e2007- 00197-4
4. S. Facsko, T. Dekorsy, C. Koerdt, C. Trappe, H. Kurz, A. Vogt, and H. L. Hartnagel, Science 285, 1551 (1999). 10.1126/science.285.5433.1551
5. E. Chason, T. M. Mayer, and A. Payne, Appl. Phys. Lett. 60, 2353 (1992). 10.1063/1.107023
6. G. Boulousis, V. Constantoudis, G. Kokkoris, and E. Gogolides, Nanotechnology 19, 255301 (2008). 10.1088/0957-4484/19/25/255301
7. G. Kokkoris, V. Constantoudis, P. Angelikopoulos, G. Boulousis, and E. Gogolides, Phys. Rev. B 76, 193405 (2007). 10.1103/PhysRevB.76.193405
8. E. Gogolides, C. Boukouras, G. Kokkoris, O. Brain, A. Tserepi, and V. Constantoudis, Microelectron. Eng. 73-74, 312 (2004). 10.1016/S0167-9317(04) 00117-0
9. R. Petri, P. Brault, O. Vatel, D. Henry, E. Andre, P. Dumas, and F. Salvan, J. Appl. Phys. 75, 7498 (1994). 10.1063/1.356622
10. J. T. Drotar, Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, Phys. Rev. B 61, 3012 (2000). 10.1103/PhysRevB.61.3012
11. M. Martina and G. Cunge, J. Vac. Sci. Technol. B 26, 1281 (2008). 10.1116/1.2932091
12. H. Tanaka, D. Cheng, M. Shikida, and K. Sato, Sens. Actuators, A 134, 465 (2007). 10.1016/j.sna.2006.06.017
13. R. D. Mansano, P. Verdonck, and H. S. Maciel, Vacuum 48, 677 (1997). 10.1016/S0042-207X(97)00067-5
14. Y. Osano and K. Ono, Jpn. J. Appl. Phys. 44, 8650 (2005). 10.1143/JJAP.44.8650
15. S. W. Ong, E. S. Tok, and H. C. Kang, Phys. Rev. E 75, 061607 (2007). 10.1103/PhysRevE.75.061607
16. E. S. Tok, S. W. Ong, and H. C. Kang, Phys. Rev. E 70, 011604 (2004). 10.1103/PhysRevE.70.011604
17. U. Cvelbar, S. Pejovnik, M. Mozetie, and A. Zalar, Appl. Surf. Sci. 210, 255 (2003). 10.1016/S0169-4332(02)01286-2
18. E. Zakka, V. Constantoudis, and E. Gogolides, IEEE Trans. Plasma Sci. 35, 1359 (2007). 10.1109/TPS.2007.906135
19. F. Family and T. Vicsek, J. Phys. A 18, L75 (1985). 10.1088/0305-4470/18/ 2/005
20. J. J. Ramasco, J. M. Lopez, and M. A. Rodriguez, Phys. Rev. Lett. 84, 2199 (2000). 10.1103/PhysRevLett.84.2199
21. J. M. Lopez, M. Castro, and R. Gallego, Phys. Rev. Lett. 94, 166103 (2005). 10.1103/PhysRevLett.94.166103
22. S. Yim, T. S. Jones, Phys. Rev. B 73, 161305 (R) (2006). 10.1103/PhysRevB.73.161305
23. M. A. Auger, L. Vázquez, R. Cuerno, M. Castro, M. Jergel, and O. Sánchez, Phys. Rev. B 73, 045436 (2006). 10.1103/PhysRevB.73.045436
24. Y.-P. Zhao, G.-C. Wang, and T.-M. Lu, Experimental Methods in the Physical Science Vol. 37 (Academic, New York 2001).
25. W. M. Tong and R. W. Stanley, Annu. Rev. Phys. Chem. 45, 401 (1994). 10.1146/annurev.pc.45.100194.002153
26. D. Marton and J. Fine, Thin Solid Films 151, 433 (1987). 10.1016/0040-6090(87)90142-8