Effect of magnesium in KOH solution on the anisotropic wet etching of silicon

Sensors and Actuators, A: Physical

Volumn 134, Issue 2, 2007, Pages 465-470

  Tanaka, Hiroshi ^a   Cheng, Di ^a   Shikida, Mitsuhiro ^a   Sato, Kazuo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Etching rate; Magnesium; Silicon; Surface roughness; Wet etching

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; MAGNESIUM; POTASSIUM COMPOUNDS; SINGLE CRYSTAL SURFACES; SURFACE ROUGHNESS; WET ETCHING;

ANISOTROPIC WET ETCHING; ETCHING RATE;

SILICON;

EID: 33847358130     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.06.017     Document Type: Article

References (12)

1. Marek J., Trah H.P., Suzuki Y., and Yokomori I. Sensors for automotive applications. Sensors Applications, vol. 4 (2003), Wiley/VCH
2. Fleming W.J. Overview of automotive sensors. IEEE Sens. 1 (2001) 296
3. Campbell S.A., Cooper K., Dixon L., Earwaker R., Port S.N., and Schiffri J. Inhibition of pyramid formation in the etching of Si p〈1 0 0〉 in aqueous potassium hydroxide-isopropanol. J. Micromech. Microeng. 5 (1995) 209
4. Hein A., Dorcsh O., and Obermeier E. Effects of metallic impurities on anisotropic etching of silicon in aqueous KOH-solutions. Proceedings of Transducers'97. Chicago, June 16-19 (1999) 687
5. Gosalvez M.A., and Nieminen R.M. Surface morphology during anisotropic wet chemical etching of crystalline silicon. New J. Phys. 5 (2003) 1
6. Tanaka H., Abe Y., Yoneyama T., Ishikawa J., Takenaka O., and Inoue K. Effects of small amount of impurities on etching of silicon in aqueous potassium hydroxide solution. Sens. Actuators A 82 (2000) 270
7. Tanaka H., Abe Y., Inoue K., Shikida M., and Sato K. Effects of ppb-level metal impurities in aqueous potassium hydroxide solution on the etching of Si{1 1 0} and {1 0 0}. Sens. Mater. 15 (2003) 43
8. Tanaka H., Cheng D., Shikida M., and Sato K. Characterization of anisotropic wet etching properties of single crystal silicon: effects of ppb-level of Cu and Pb in KOH solution. Sens. Actuators A 128 (2006) 125
9. Pourbaix M. Atlas of Electrochemical Equilibria in Aqueous Solutions (1966), Pergamon Press, London
10. Sato K., Shikida M., Matsushima Y., Yamamoto T., Asaumi K., Iriye Y., and Yamamoto Y. Characterization of orientation-dependent etching properties of single-crystal silicon: effects of KOH concentration. Sens. Actuators A 64 (1998) 87
11. Shikida M., Tokoro K., Uchikawa D., and Sato K. Surface morphology of anisotropically etched single-crystal silicon. J. Micromech. Microeng. 10 (2000) 522
12. Tanaka H., Yamashita S., Abe Y., Shikida M., and Sato K. Fast etching of silicon with a smooth surface in high temperature ranges near the boiling point of KOH solution. Sens. Actuators A 114 (2004) 526