Through-focus pattern matching applied to double patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Rubinstein, Juliet ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Defocus; Double patterning; Pattern matching

Indexed keywords

COHERENT ILLUMINATION; CONVOLUTION KERNEL; DEFOCUS; DOUBLE PATTERNING; INTENSITY CHANGE; LINE ENDS; PATTERN MATCH; TAYLOR SERIES EXPANSIONS;

PATTERN MATCHING;

EID: 65849507051     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814190     Document Type: Conference Paper

References (10)

1. Lin, B. J., "The Exposure Defocus Forest", Japanese Journal of Applied Physics 33, Issue 12B, pp. 6756 (1994)
2. Lalovic, I., Kritsun, O., McGowan, S., Bendik, J., Smith, M., Farrar, N., "Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling", Proceedings of the SPIE 7122, pp. 7122IR-71221R-12 (2008)
3. th International Symposium on Quality Electronic Design, p 165-170 (2004)
4. Robins, G., Neureuther, A., "Are pattern and probe aberration monitors ready for prime time?" Proc. SPIE 5754, pp. 1704-1715 (2005)
5. McIntyre, G., Holwill, J., Neureuther, A., Capodieci, L., Zou, Y., Levinson, H., Kye J., "Screening layouts for high-NA polarization effects using pattern matching," J. Vac. Sci. Technol.B 23, Issue 6, pp. 2646-2652 (2005)
6. Holwill, J., McIntyre, G., Poppe, W., Neureuther, A., "Layout 'Hot Spots' for Advancing Optical Technologies" Proc. SPIE 6154, pp. 1212-1220 (2006).
7. Rubinstein, J., Neureuther, A., "Post Decomposition Assessment of Double Patterning Layout," Proc. SPIE 6924, pp. 69240O-69240O-12 (2008)
8. Wang, L.T., Poppe, W. J., Pang, L., Neureuther, A. R., Alon, E., Nikolic, B., "Hypersensitive parameter-identifying ring oscillators for lithography process monitoring", Proc. SPIE 6925, pp. 69250P-69250P-10 (2008)
9. Chin, E., Holwill J., and Neureuther, A., "Prediction of interconnect delay variations using pattern matching", Proc. SPIE 6521, pp. 65210I (2007)
10. Robins, G., Dusa, M., Geh, B., Neuruther, A., "Interferometric-probe aberration monitors: aerial image and in-resist performance", Proc. SPIE 5256, pp. 309-317 (2003)