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Volumn 7122, Issue , 2008, Pages

Defining a physically accurate laser bandwidth input for optical proximity correction (OPC) and modeling

Author keywords

Aberrations; Bandwidth; Chromatic; Excimer; Focus; Gaussian; Illumination; Laser; Lithography; Modified Lorentzian; optical; Proximity; Resolution

Indexed keywords

CHROMATIC; EXCIMER; FOCUS; GAUSSIAN; ILLUMINATION; MODIFIED LORENTZIAN; OPTICAL; PROXIMITY; RESOLUTION;

EID: 62649126102     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801556     Document Type: Conference Paper
Times cited : (14)

References (14)
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  • 2
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  • 3
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    • Effects of illumination spectral width on mask error enhancement factor and isodense bias in 0.6NA KrF imaging
    • I. Lalovic et al., "Effects of illumination spectral width on mask error enhancement factor and isodense bias in 0.6NA KrF imaging," Proc. SPIE Phot. Tech. Symp. BACUS XXI 4562 (2001).
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    • Lalovic, I.1
  • 4
    • 33745783315 scopus 로고    scopus 로고
    • Effects of laser bandwidth on OPE in a modern lithography tool
    • K. Huggins et al., "Effects of laser bandwidth on OPE in a modern lithography tool," Proc. SPIE Optical Microlithography XIX 6154 (2006).
    • (2006) Proc. SPIE Optical Microlithography XIX , vol.6154
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  • 5
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    • Laser bandwidth and other sources of focus blur in lithography
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  • 6
    • 45449113960 scopus 로고    scopus 로고
    • 45nm node logic device OPE matching between exposure tools through laser bandwidth tuning
    • Yoshimochi et al, "45nm node logic device OPE matching between exposure tools through laser bandwidth tuning," Proc. SPIE Optical Microlithoraphy XXI 6924 (2008).
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    • Yoshimochi1
  • 8
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    • XLR 600i: Recirculating ring ArF light source for double patterning immersion lithography
    • V. Fleurov et al, "XLR 600i: recirculating ring ArF light source for double patterning immersion lithography," Proc. SPIE Optical Microlithoraphy XXI 6924 (2008).
    • (2008) Proc. SPIE Optical Microlithoraphy XXI , vol.6924
    • Fleurov, V.1
  • 9
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    • PROLITH is a registered trademark of KLA-Tencor, San Jose, CA.
  • 10
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  • 11
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  • 12
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  • 13
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    • Fast and accurate modeling of laser bandwidth for optical proximity correction
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  • 14
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    • N. Seong et al, Analysis of the effect of laser bandwidth on imaging of memory patterns, to be published at SPIE Lithography Asia, November 2008, Taiwan.
    • N. Seong et al, "Analysis of the effect of laser bandwidth on imaging of memory patterns," to be published at SPIE Lithography Asia, November 2008, Taiwan.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.