-
1
-
-
62649135051
-
-
International Technology Roadmap for Semiconductors (ITRS), 2006 Update, Lithography Modeling and Simulation, http://www.itrs.net/reports.html
-
International Technology Roadmap for Semiconductors (ITRS), 2006 Update, Lithography Modeling and Simulation, http://www.itrs.net/reports.html
-
-
-
-
2
-
-
0033697537
-
Modeling the effects of excimer laser bandwidths on lithographic performance
-
A. Kroyan et al., "Modeling the effects of excimer laser bandwidths on lithographic performance," Proc. SPIE Optical Microlithography XIV 4000 (2000).
-
(2000)
Proc. SPIE Optical Microlithography XIV
, vol.4000
-
-
Kroyan, A.1
-
3
-
-
0141652611
-
Effects of illumination spectral width on mask error enhancement factor and isodense bias in 0.6NA KrF imaging
-
I. Lalovic et al., "Effects of illumination spectral width on mask error enhancement factor and isodense bias in 0.6NA KrF imaging," Proc. SPIE Phot. Tech. Symp. BACUS XXI 4562 (2001).
-
(2001)
Proc. SPIE Phot. Tech. Symp. BACUS XXI
, vol.4562
-
-
Lalovic, I.1
-
4
-
-
33745783315
-
Effects of laser bandwidth on OPE in a modern lithography tool
-
K. Huggins et al., "Effects of laser bandwidth on OPE in a modern lithography tool," Proc. SPIE Optical Microlithography XIX 6154 (2006).
-
(2006)
Proc. SPIE Optical Microlithography XIX
, vol.6154
-
-
Huggins, K.1
-
5
-
-
33745790897
-
Laser bandwidth and other sources of focus blur in lithography
-
Brunner et al, "Laser bandwidth and other sources of focus blur in lithography," Proc. SPIE Optical Microlithography XIX 6154 (2006).
-
(2006)
Proc. SPIE Optical Microlithography XIX
, vol.6154
-
-
Brunner1
-
6
-
-
45449113960
-
45nm node logic device OPE matching between exposure tools through laser bandwidth tuning
-
Yoshimochi et al, "45nm node logic device OPE matching between exposure tools through laser bandwidth tuning," Proc. SPIE Optical Microlithoraphy XXI 6924 (2008).
-
(2008)
Proc. SPIE Optical Microlithoraphy XXI
, vol.6924
-
-
Yoshimochi1
-
7
-
-
65849409922
-
Impact of finite laser bandwidth on the CD of L/S structures
-
De Bisschop et al, "Impact of finite laser bandwidth on the CD of L/S structures," Journal of Micro / Nanolithography, MEMS and MOEMS (JM3), Vol. 7, No. 3, (2008).
-
(2008)
Journal of Micro / Nanolithography, MEMS and MOEMS (JM3)
, vol.7
, Issue.3
-
-
Bisschop, D.1
-
8
-
-
45449106609
-
XLR 600i: Recirculating ring ArF light source for double patterning immersion lithography
-
V. Fleurov et al, "XLR 600i: recirculating ring ArF light source for double patterning immersion lithography," Proc. SPIE Optical Microlithoraphy XXI 6924 (2008).
-
(2008)
Proc. SPIE Optical Microlithoraphy XXI
, vol.6924
-
-
Fleurov, V.1
-
9
-
-
62649168190
-
-
PROLITH is a registered trademark of KLA-Tencor, San Jose, CA
-
PROLITH is a registered trademark of KLA-Tencor, San Jose, CA.
-
-
-
-
11
-
-
3843105089
-
Understanding chromatic aberration impacts on lithographic imaging
-
Lai et al., "Understanding chromatic aberration impacts on lithographic imaging," Journal of Microlithography, Microfabrication, and Microsystems (JM3), Vol. 2, No. 2, pp105-111 (2003).
-
(2003)
Journal of Microlithography, Microfabrication, and Microsystems (JM3)
, vol.2
, Issue.2
, pp. 105-111
-
-
Lai1
-
12
-
-
62649118080
-
-
private communication
-
R. Rafac, private communication
-
-
-
Rafac, R.1
-
13
-
-
62649125544
-
Fast and accurate modeling of laser bandwidth for optical proximity correction
-
I. Lalovic et al, "Fast and accurate modeling of laser bandwidth for optical proximity correction," Proc. BACUS XXI Photomask Technology Symposium 6730-66, (2007).
-
(2007)
Proc. BACUS XXI Photomask Technology Symposium
, pp. 6730-6766
-
-
Lalovic, I.1
-
14
-
-
62449230560
-
-
N. Seong et al, Analysis of the effect of laser bandwidth on imaging of memory patterns, to be published at SPIE Lithography Asia, November 2008, Taiwan.
-
N. Seong et al, "Analysis of the effect of laser bandwidth on imaging of memory patterns," to be published at SPIE Lithography Asia, November 2008, Taiwan.
-
-
-
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