Layout 'hot spots' for advancing optical technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Holwill, Juliet ^a   McIntyre, Gregory ^a   Poppe, Wojtek ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberrations; Attenuated masks; Double exposure; High NA; Off axis illumination; Optical proximity correction; Pattern matching; Polarization

Indexed keywords

ATTENUATED MASKS; DOUBLE EXPOSURE; HIGH NA; OFF-AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTION;

ABERRATIONS; ATTENUATION; COMPUTATIONAL METHODS; COMPUTER SIMULATION; LIGHTING; PHOTOLITHOGRAPHY; POLARIZATION; SCANNING;

PATTERN MATCHING;

EID: 33745783312     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656819     Document Type: Conference Paper

References (6)

1. F. Gennari and A. Neureuther, "A Pattern Matching System for Linking TCAD and EDA", IDQED 2004: 165-170.
2. G. McIntyre, J. Holwill, A. Neureuther, L. Capodieci, Y. Zou, H. Levinson, and J. Kye, "Screening layouts for high-NA polarization effects using pattern matching," J. Vac Sci. Technol. B: Microelectronics and Nanometer Structures, vol. 23(6), pp. 2646-2652, Nov. 2005.
3. G. Robins and A. Neureuther, "Are Pattern and Probe Aberration Monitors ready for Prime Time?" Proc. SPIE 5754, 1704, 2004.
4. F. Gennari, PhD. Dissertation, University of California, Berkeley, 2004.
5. E. Hendrickx, A Torres, N.V. Lafferty, S. Johnson, L. Le Cam, C. Reita, G. Vandenberghe, W. Maurer, "Complementary double-exposure solutions at 0.29kl," Proc. SPIE Vol. 5754, p. 327-338, 2005.
6. F. Gennari, G. Robins, A. Neureuther, "Validation of the Aberration-Pattern-Matching OPC Strategy", Proc. SPIE 4692, 444 (2002)