Hypersensitive parameter-identifying ring oscillators for lithography process monitoring

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6925, Issue , 2008, Pages

  Wang, Lynn Tao Ning ^a   Poppe, Wojtek J ^a   Pang, Liang Teck ^a   Neureuther, Andrew R ^a   Alon, Elad ^a   Nikolic, Borivoje ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

DfM; Electronic testing; Focus monitor; Layout; Lithography; Phase shifting mask; Ring oscillator; Variability

Indexed keywords

CIRCUIT SIMULATION; GEOMETRY; LITHOGRAPHY; MOS DEVICES; NETWORKS (CIRCUITS); PARAMETER ESTIMATION;

ELECTRONIC TESTING; FOCUS MONITORS; PHASE SHIFTING MASKS; RING OSCILLATORS;

OSCILLATORS (ELECTRONIC);

EID: 43249102453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773184     Document Type: Conference Paper

References (8)

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2. A.H. Gabor, et al, "Improving the Power-Performance of Multicore Processors Through Optimization of Lithography and Thermal Processing", SPIE, Volume 6521-18 (2007).
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5. http://www.eas.asu.edu/~ptm/latest.html
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8. W, Poppe, "Ph.D Thesis, " December 2007