Are pattern and probe aberration monitors ready for prime time?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 3, 2005, Pages 1704-1715

  Robins, Garth C ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Aberration monitor; AIMS; Focus monitor; High NA; Illumination; Image; Intensity imbalance; Interference; Phase shifting mask; Printable artifact; Resist image; Zernike aberrations

Indexed keywords

ELECTRIC FIELDS; IMAGE ANALYSIS; INTERFEROMETRY; MAGNETOELECTRIC EFFECTS; PATTERN RECOGNITION; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS; VECTORS;

ABERRATION MONITOR; FOCUS MONITOR; HIGH-NA; IMAGES; INTENSITY IMBALANCE; INTERFERENCE; PHASE-SHIFTING MASK; PRINTABLE ARTIFACT; RESIST IMAGE; ZERNIKE ABERRATIONS;

ABERRATIONS;

EID: 25144443071     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600611     Document Type: Conference Paper

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