Prediction of interconnect delay variations using pattern matching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Chin, Eric Y ^a   Holwill, Juliet A ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Coma; Defocus; Extraction; Maximum lateral impact function; Pattern matching; Process variation; Timing

Indexed keywords

CAPACITANCE; DELAY CIRCUITS; ELECTRIC CONDUCTORS; ELECTRIC RESISTANCE; LARGE SCALE SYSTEMS; PERTURBATION TECHNIQUES; SCANNING;

COMA; DEFOCUS; MAXIMUM LATERAL IMPACT FUNCTION; PROCESS VARIATION NET SCANNING (PVNS);

PATTERN MATCHING;

EID: 35148836136     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712257     Document Type: Conference Paper

References (8)

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