Interferometric-probe aberration monitors: Aerial image and in-resist performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 309-317

  Robins, Garth C ^a   Dusa, Mircea ^a   Geh, Bernd ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Aberration monitor; Focus monitor; High NA; Illumination; Image; Intensity imbalance; Interference; Phase shifting mask; Printable artifact; Resist image; Zernike aberrations

Indexed keywords

ABERRATIONS; AERIAL PHOTOGRAPHY; COMPUTER SIMULATION; ELECTROMAGNETISM; INTERFEROMETRY; LITHOGRAPHY; MASKS; PHASE SHIFT; PHOTORESISTORS;

ABERRATION MONITOR; FOCUS MONITOR; HIGH-NA; IMAGES; INTENSITY IMBALANCE; PHASE-SHIFTING MASKS (PSM); PRINTABLE ARTIFACTS; RESIST IMAGE; ZERNIKE ABERRATIONS;

COMPUTER MONITORS;

EID: 1842475074     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518603     Document Type: Conference Paper

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