Single component molecular resists containing bound photoacid generator functionality

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Lawson, Richard A ^a   Tolbert, Laren M ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Bound PAG molecular resist; Chemically amplified photoresist; High PAG loading; Line edge roughness; Molecular resist; Photoacid generator; Single component resist; Single molecule resist

Indexed keywords

BOUND PAG MOLECULAR RESIST; CHEMICALLY AMPLIFIED PHOTORESIST; HIGH PAG LOADING; LINE EDGE ROUGHNESS; MOLECULAR RESIST; PHOTOACID GENERATOR; SINGLE COMPONENT RESIST; SINGLE MOLECULE RESIST;

ELECTRON BEAM LITHOGRAPHY; GLASS TRANSITION; MOLECULES; PHOTORESISTORS; PHOTORESISTS; SURFACE TREATMENT;

ROUGHNESS MEASUREMENT;

EID: 65849209117     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814426     Document Type: Conference Paper

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