Structural design of a new class of acetal polymer for DUV resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (I), Issue , 2000, Pages 579-590

  Fujimori, Toru ^a   Tan, Shiro ^a   Aoai, Toshiaki ^a   Nishiyama, Fumiyuki ^a   Yamanaka, Tsukasa ^a   Momota, Makoto ^a   Kanna, Shinichi ^a   Kawabe, Yasumasa ^a   Yagihara, Morio ^a   Kokubo, Tadayoshi ^a   Malik, Sanjay ^a   Ferreira, Lawrence ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; DISSOLUTION; DRY ETCHING; POLYSTYRENES; SYNTHESIS (CHEMICAL);

FUNCTIONALIZED ACETALS; POLYHYDROXY STYRENE;

PHOTORESISTS;

EID: 0033708524     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388342     Document Type: Conference Paper

References (13)