Recent advances in acetal-based DUV resists

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 591-600

  Malik, Sanjay ^a   Blakeney, Andrew J ^a   Ferreira, Lawrence ^a   Maxwell, Brian ^a   Van Driessche, Veerle ^b   Whewell, Allyn ^a   Sarubbi, Thomas R ^a   Bowden, Murrae J ^a   Fujimori, Toru ^c   Tan, Shiro ^c   Aoai, Toshiaki ^c   Uenishi, Kazuya ^c   Kawabe, Yasumasa ^c   Kokubo, Tadayoshi ^d  

^a Arch Chemicals Incorporated   (United States)

^b Arch Chemicals N V Keetberglaan 1A   (Belgium)

^c FUJIFILM CORPORATION   (Japan)

^d Olin Corporation   (United States)

Author keywords

Bulky acetals; Chemical amplification; Film shrinkage; Positive DUV resist

Indexed keywords

EID: 0005010697     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.591     Document Type: Article

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