Formation of microstructural defects in electrodeposited Co/Cu multilayers

Acta Materialia

Volumn 57, Issue 11, 2009, Pages 3211-3222

  Rafaja, D ^a   Schimpf, C ^a   Klemm, V ^a   Schreiber, G ^a   Bakonyi, I ^b   Peter L ^b  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

Co Cu multilayers; Electrodeposition; Giant magnetoresistance; High resolution electron microscopy; X ray scattering

Indexed keywords

CO/CU MULTILAYERS; COPPER LAYER; HIGH RESOLUTION; MAGNETORESISTANCE CURVES; MAGNETORESISTANCE EFFECTS; MAGNETORESISTANCE MEASUREMENTS; MAIN TASKS; MICROSTRUCTURAL ANALYSIS; MICROSTRUCTURAL DEFECTS; SMALL ANGLE X-RAY SCATTERING;

CORROSION; DEFECTS; ELECTRIC RESISTANCE; ELECTRODEPOSITION; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; GALVANOMAGNETIC EFFECTS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETOELECTRONICS; MULTILAYERS; SCATTERING; X RAY SCATTERING;

GIANT MAGNETORESISTANCE;

EID: 65649141644     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2009.03.029     Document Type: Article

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