Relevance of the potentiodynamic method in parameter selection for pulse-plating of Co-Cu/Cu multilayers

Electrochimica Acta

Volumn 49, Issue 9-10, 2004, Pages 1513-1526

  Péter, László ^a   Liu, Qunxian ^a   Kerner, Zsolt ^b   Bakonyi, Imre ^a  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b KFKI ATOMIC ENERGY RESEARCH INSTITUTE   (Hungary)

Author keywords

Deposit structure; Electrodeposition; Multilayers; Potentiodynamic measurements; Pulse plating

Indexed keywords

ADSORPTION; CYCLIC VOLTAMMETRY; DESORPTION; DISSOLUTION; ELECTRODEPOSITION; ELECTRODES; ELECTROLYTES; MULTILAYERS;

DEPOSIT STRUCTURE; POTENTIODYNAMIC MEASUREMENTS; PULSE PLATING;

ELECTROCHEMISTRY;

EID: 1042265786     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2003.11.017     Document Type: Article

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