Dependence of interface roughness and diffuseness of Cu-Co electrodeposited multilayers on electrochemical additives

Journal of Applied Physics

Volumn 94, Issue 5, 2003, Pages 3035-3040

  Merkourakis, Spyridon ^a,b   Hÿtch, Martin J ^a   Chassaing, Elisabeth ^a   Walls, Michael G ^a   Leprince Wang, Yamin ^b  

^a CNRS   (France)

^b National Centre of Scientific Research   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; DIFFUSION; ELECTROCHEMISTRY; ELECTRODEPOSITION; GIANT MAGNETORESISTANCE; NUMERICAL METHODS; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

INTERFACE ROUGHNESS;

MULTILAYERS;

EID: 0141857549     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1599626     Document Type: Article

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