Changes in the real structure and magnetoresistance of Co 90Fe10/Cu and Co90Fe10/Cu 85Ag10Au5 multilayers after annealing

Thin Solid Films

Volumn 460, Issue 1-2, 2004, Pages 256-263

  Rafaja, David ^a   Ebert, Jörg ^b   Miehe, Gerhard ^b   Martz, Nathalie ^b   Knapp, Michael ^b   Stahl, Branko ^b   Ghafari, Mohammad ^b   Hahn, Horst ^b   Fuess, Hartmut ^b   Schmollngruber, Peter ^c   Farber, Paul ^c   Siegle, Henrik ^c  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^c ROBERT BOSCH GMBH   (Germany)

Author keywords

Co Cu multilayers; Real structure; Small angle X ray scattering; Transmission electron microscopy; X Ray diffraction

Indexed keywords

COBALT COMPOUNDS; COPPER COMPOUNDS; ELECTROMAGNETIC WAVE SCATTERING; INTERFACES (MATERIALS); MOLECULAR STRUCTURE; MULTILAYERS; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURE; CO/CU MULTILAYERS; MAGNETIC GRANULES; SMALL ANGLE X RAY SCATTERING;

THIN FILMS;

EID: 2942539108     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.099     Document Type: Article

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