The nanofabrication of polydimethylsiloxane using a focused ion beam

Nanotechnology

Volumn 20, Issue 14, 2009, Pages

  Guan, Li ^a   Peng, Kaiwu ^a   Yang, Yanlian ^a   Qiu, Xiaohui ^a   Wang, Chen ^a  

^a NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; BEAM DOSE; CHARGE ACCUMULATIONS; FABRICATED ARRAYS; FLEXIBLE FILMS; NANO FABRICATIONS; POLYDIMETHYLSILOXANE PDMS; SWELLING EFFECTS;

BEAM PLASMA INTERACTIONS; ELECTRON BEAMS; FABRICATION; ION BOMBARDMENT; IONS; SILICONES;

FOCUSED ION BEAMS;

POLYDIMETHYSILOXANE; SILOXANE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRIC CURRENT; ELECTRICITY; ELECTRON BEAM; FLOODING; FOCUSED ION BEAM; HEIGHT; MICROARRAY ANALYSIS; NANOFABRICATION; NANOTECHNOLOGY; POLYMERIZATION; PRIORITY JOURNAL; RADIATION DEPTH DOSE; TOPOGRAPHY;

EID: 65549158381     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/14/145301     Document Type: Article

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