Phase separation in carbon-nickel films during hyperthermal ion deposition

Journal of Applied Physics

Volumn 105, Issue 8, 2009, Pages

  Abrasonis, G ^a,b   Kovacs Gy J ^b   Ryves, L ^a   Krause, M ^b   Mucklich A ^b   Munnik, F ^b   Oates, T W H ^b   Bilek, M M M ^a   Moller W ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADATOM DIFFUSIONS; ATOMIC DISPLACEMENTS; CONTINUOUS LAYERS; CROSS-SECTIONAL TRANSMISSION ELECTRON MICROSCOPIES; DEPTH PROFILES; ELASTIC RECOIL DETECTION ANALYSIS; FILM MORPHOLOGIES; FILTERED CATHODIC VACUUM ARCS; GROWING FILMS; ION DEPOSITIONS; METAL CONTENTS; METALLIC ISLANDS; MICROSTRUCTURE EVOLUTIONS; NANO-COMPOSITE FILMS; NI CONTENTS; NICKEL CARBIDES; NICKEL FILMS; ROOM TEMPERATURES; SELECTED AREA ELECTRON DIFFRACTIONS; SELF-ORGANIZED GROWTHS; SI SUBSTRATES; STRUCTURE ZONE MODELS; SUBSTRATE TEMPERATURES; THERMALLY OXIDIZED;

CARBIDES; CARBON FILMS; COALESCENCE; CRYSTAL ATOMIC STRUCTURE; FILM GROWTH; GROWTH TEMPERATURE; IONS; MICROSTRUCTURE; NANOCOMPOSITES; NICKEL ALLOYS; PHASE SEPARATION; SUBSTRATES; SURFACE DIFFUSION; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

NICKEL;

EID: 65449149696     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3110187     Document Type: Article

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