Well-aligned nanocylinder formation in phase-separated metal-silicide- silicon and metal-germanide-germanium systems

Advanced Materials

Volumn 19, Issue 19, 2007, Pages 2797-2801

  Yasui, Nobuhiro ^a   Horie, Ryoko ^a   Ohashi, Yoshihiro ^a   Tanji, Koichi ^a   Den, Tohru ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

DIE-PATTERNED FILMS; METAL-GERMANIDE-GERMANIUM SYSTEMS; NANOCYLINDER; RADIO-FREQUENCY (RF) MEGATRON SPUTTERING;

NANOSYSTEMS;

EID: 35348978356     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200700726     Document Type: Article

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