Phase-separated Al-Si thin films

Journal of Applied Physics

Volumn 98, Issue 3, 2005, Pages

  Fukutani, Kazuhiko ^a   Tanji, Koichi ^a   Saito, Tatsuya ^a   Den, Tohru ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM MORPHOLOGY; NANOCYLINDERS; SUBSTRATE TEMPERATURE; SURFACE DIFFUSION;

ALUMINUM COMPOUNDS; COMPOSITION; COMPUTER SIMULATION; DEPOSITION; DIFFUSION; MORPHOLOGY; PHASE SEPARATION; SPUTTERING;

THIN FILMS;

EID: 23944523357     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1994942     Document Type: Article

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