Gold-implanted shallow conducting layers in polymethylmethacrylate

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Teixeira, F S ^a   Salvadori, M C ^a   Cattani, M ^a   Brown, I G ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCES; CATHODIC ARCS; CONDUCTING LAYERS; DEPTH PROFILES; DYNAMIC TRIMS; ELECTRICAL CONDUCTIVITIES; GOLD SURFACES; IMPLANTATION DOSE; IMPLANTED MATERIALS; IN-SITU; ION IMPLANTED; LITHOGRAPHIC PATTERNS; LOW ENERGIES; METAL PLASMAS; NANO-METER SCALE; POLYMER SURFACES; POLYMETHYLMETHACRYLATE; RUTHERFORD BACK-SCATTERING SPECTROMETRIES; SURFACE-MODIFIED; TEST PATTERNS;

COMPUTER SIMULATION; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; GOLD; POLYESTERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACES;

CONDUCTING POLYMERS;

EID: 63749089086     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3088874     Document Type: Article

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