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Volumn 80, Issue 22, 2002, Pages 4220-4222
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Molecular patterning through high-resolution polymethylmethacrylate masks
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
HIGH RESOLUTION;
MASKING TECHNIQUE;
MOLECULAR PATTERNING;
PYRAZINES;
SURFACE CHARACTERISTICS;
ACETONE;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
DICHLOROMETHANE;
ELECTRON BEAMS;
MONOLAYERS;
POLYESTERS;
SILICA;
X RAY PHOTOELECTRON SPECTROSCOPY;
SILICON WAFERS;
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EID: 79956009722
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1481784 Document Type: Article |
Times cited : (33)
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References (12)
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