Contamination due to memory effects in filtered vacuum arc plasma deposition systems

Applied Physics Letters

Volumn 81, Issue 11, 2002, Pages 1969-1971

  Martins, D R ^a   Salvadori, M C ^a   Verdonck, P ^a   Brown, I G ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; FILM DEPOSITION; LONG LASTING; MACROPARTICLE FILTER; MAGNETIC FIELD COIL; MEMORY EFFECTS; STOPPING AND RANGE OF IONS IN MATTERS; TECHNOLOGICAL APPLICATIONS; THIN FILM SYNTHESIS; VACUUM ARC PLASMA; VACUUM VESSEL;

DEPOSITION; MAGNETIC FIELDS; PLASMA GUNS; PLASMAS; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

PLASMA DEPOSITION;

EID: 79956006812     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506019     Document Type: Article

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