Threshold ionization mass spectrometry in the presence of excited silane radicals

Journal of Physics D: Applied Physics

Volumn 42, Issue 7, 2009, Pages

  Moiseev, T ^a   Chrastina, D ^a   Isella, G ^a   Cavallotti, C ^a  

^a POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYDROGEN; IONIZATION; MASS SPECTROMETERS; MASS SPECTROMETRY; PLASMAS; SILANES; SPECTRUM ANALYSIS;

CHEMICAL VAPOUR DEPOSITIONS; GROUND-STATE; HYDROGEN PLASMAS; NANO-CRYSTALLINE; PHOTOVOLTAIC APPLICATIONS; RADICAL DENSITIES; RELATIVE DENSITIES; SI LAYERS; THRESHOLD IONIZATION MASS SPECTROMETRIES; TOTAL PRESSURES; TURNING POINTS;

PLASMA DEPOSITION;

EID: 63649130467     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/7/072003     Document Type: Article

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