Structural characterization of nc-Si films grown by low-energy PECVD on different substrates

Applied Surface Science

Volumn 254, Issue 9, 2008, Pages 2804-2808

  Le Donne, A ^a   Binetti, S ^a   Isella, G ^b   Pichaud, B ^c   Texier, M ^c   Acciarri, M ^a   Pizzini, S ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b L NESS   (Italy)

^c AIX MARSEILLE UNIVERSITY   (France)

Author keywords

HRTEM; LEPECVD; Nanocrystalline silicon; Raman in depth profiles; XRD

Indexed keywords

FILM GROWTH; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; X RAY DIFFRACTION;

FILM STRUCTURAL PROPERTIES; NANOCRYSTALLINE SILICON FILMS; SUBSTRATE MORPHOLOGY;

SEMICONDUCTING FILMS;

EID: 38949128415     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.10.025     Document Type: Article

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