Line-type inductively coupled plasma source with ferromagnetic module

Journal of Physics D: Applied Physics

Volumn 42, Issue 1, 2009, Pages

  Lim, Jong Hyeuk ^a   Kim, Kyong Nam ^a   Gweon, Gwang Ho ^a   Yeom, Geun Young ^a,b  

^a Sungkyunkwan University   (South Korea)

^b National Program for Tera Level Devices   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; FERROMAGNETIC MATERIALS; FERROMAGNETISM; INDUCTIVELY COUPLED PLASMA; MAGNETIC FIELDS; PHOTORESISTS; PLASMA DENSITY; PLASMA SOURCES; ZINC;

ETCH UNIFORMITIES; GLASS SUBSTRATES; ICP SOURCES; INDUCTIVELY COUPLED PLASMA SOURCES; INTERNAL ANTENNAS; PLASMA UNIFORMITIES; RADIO FREQUENCY POWER; ROLL-TO-ROLL PROCESSING; TIME-VARYING MAGNETIC FIELDS;

PLASMA DISPLAY DEVICES;

EID: 63649122266     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/1/015204     Document Type: Article

References (18)

1. Yamakoshi H, Satake K, Takeuchi Y, Mashima H and Aoi T 2006 Appl. Phys. Lett. 88 081502
2. Sakawa Y, Yano K and Shoji T 2004 J. Vac. Sci. Technol. A 22 L7
3. Aken B, Devilee C, Dorenkamper M, Geuseboek M, Heijna M, Loffler J and Soppe W 2008 J. Non-Cryst. Solids. 354 2392
4. Hamers E, Donker M, Stannowski B, Schlatmann R and Jongerden G 2007 Plasma Process. Polym. 4 275
5. Aanesland A, Liard L, Leray G, Jolly J and Chabert P 2007 Appl. Phys. Lett. 91 121502
6. Yoshida Z and Uchida T 1995 Japan. J. Appl. Phys. Part 1 34 4213
7. O'Connell D, Crintea D L, Gans T and Czarnetzki U 2007 Plasma Sources Sci. Technol. 16 543
8. O'Connell D, Gans T, Crintea D L, Czarnetzki U and Sadeghi N 2008 J. Phys. D: Appl. Phys. 41 035208
9. O'Connell D, Gans T, Crintea D L, Czarnetzki U and Sadeghi N 2008 Plasma Sources Sci. Technol. 17 024022
10. Rudiger J, Brechtel H, Kottwitz A, Kuske J and Stephan U 2003 Thin Solid Films 427 16
11. Mashima H, Takeuchi Y, Noda M, Murata M, Naitou H, Kawasaki I and Kawai Y 2003 Surf. Coat. Technol. 167 72
12. Liehr M and Campo M D 2005 Surf. Coat. Technol. 200 21
13. Wu Y and Liberman M A 1998 Appl. Phys. Lett. 72 777
14. Spiliopous N, Mataras D and Rapakoulias D E 1996 J. Vac. Sci. Technol. A 14 2757
15. El-fayoumi I M and Jones I R 1997 Plasma Sources Sci. Technol. 6 201
16. Xu S, Ostrikov K N, Li Y, Tsakadze E L and Jones I R 2001 Phys. Plasmas 8 2549
17. Colpo P, Meziani T and Rossi F 2005 J. Vac. Sci. Technol. A 23 270
18. Fruchtman A, Makrinich G, Raimbault J, Liard L, Rax J M and Chabert P 2008 Phys. Plasmas 15 057102