Deposition of phosphorus doped a-Si:H and μc-Si:H using a novel linear RF source

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2392-2396

  Van Aken, Bas B ^a   Devilee, Camile ^a   Dörenkämper, Maarten ^a   Geusebroek, Marco ^a   Heijna, Maurits C R ^a   Löffler, Jochen ^a   Soppe, Wim J ^a  

^a TNO   (Netherlands)

Author keywords

Absorption; Chemical vapor deposition; FTIR measurements; Microcrystallinity; Plasma deposition; Reflectivity; Silicon

Indexed keywords

DOPING (ADDITIVES); PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTION; SILICON COMPOUNDS; THIN FILMS;

MICROCRYSTALLINITY; REACTION CHAMBER; THIN LAYERS;

PHOSPHORUS;

EID: 42649091486     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.024     Document Type: Article

References (8)

1. Schlemm H., Mai A., Roth S., Roth D., Baumgärtner K.-M., and Muegge H. Surf. Coat. Technol. 174&175 (2003) 208
2. J. Löffler, C. Devilee, M. Geusebroek, W.J. Soppe, H.-J. Muffler, in: Proceedings of 21st European Photovoltaic Solar Energy Conference, Dresden, Germany, 2006, p. 1597.
3. Schlemm H., Fritzsche M., and Roth D. Surf. Coat. Technol. 200 (2005) 958
4. Rath J.K. Sol. Energy Mater. Sol. Cells 76 (2003) 431
5. W.J. Soppe, B.B. Van Aken, C. Devilee, H. Schlemm, in: Proceedings of the 22nd European Photovoltaic Solar Energy Conference, Milan, Italy, 2007, p. 1847.
6. Van Aken B.B., Devilee C., Dörenkämper M., Geusebroek M., Heijna M., Löffler J., and Soppe W.J. Proc. SPIE Int. Soc. Opt. Eng. 6651 (2007) 66510C
7. Schropp R.E.I., and Zeman M. Amorphous and Microcrystalline Silicon Solar Cells - Modelling, Materials and Device Technology (1998), Kluwer Academic, Dordrecht, the Netherlands
8. G.E.N. Landweer, C.H.M. van der Werf, J.W. Metselaar, R.E.I. Schropp, in: Proceedings of 12th European Photovoltaic Solar Energy Conference, Amsterdam, the Netherlands, 1994, p. 1284.