Microwave PECVD for large area coating

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 21-25

  Liehr, M ^a   Dieguez Campo, M ^a  

^a Applied Films GmbH and Co KG   (Germany)

Author keywords

Microwave plasma; Organometal plasma; Silicon dioxide; Silicon thin film; Solar cell

Indexed keywords

NANOSTRUCTURED MATERIALS; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SILICA; SOLAR CELLS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

MICROWAVE PLASMA; ORGANOMETAL PLASMA; SILICON THIN FILM;

THIN FILMS;

PLASMA TREATMENT;

EID: 24644483657     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.061     Document Type: Article

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