Microstructure analyses of the titanium films formed by the ionized sputtering process

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 13-17

  Ko, Dae Hong ^a   Kim, Eun Ha ^a   Choi, Siyoung ^b   Yoo, Bong Young ^b   Lee, Hyeon Deok ^b  

^a Yonsei University   (South Korea)

^b Semiconduct RD Ctr Samsung E   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; FILM PREPARATION; ION BOMBARDMENT; IONIZATION; METALLOGRAPHIC MICROSTRUCTURE; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; TEXTURES; THICKNESS MEASUREMENT; TITANIUM;

AMORPHOUS INTERLAYER; COLLIMATED SPUTTERING; IONIZED SPUTTERING;

METALLIC FILMS;

EID: 0032651603     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01428-X     Document Type: Article

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