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Volumn 6151 II, Issue , 2006, Pages

High-temperature LPP collector mirror

Author keywords

Collector mirror; Multilayer coatings; Optics lifetime; Thermal stability

Indexed keywords

ANNEALING; COATINGS; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); LITHOGRAPHY; MIRRORS; MOLYBDENUM; SILICON; SUBSTRATES; THERMAL EFFECTS; THERMODYNAMIC STABILITY;

EID: 33745630637     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.662138     Document Type: Conference Paper
Times cited : (15)

References (11)
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    • Emerging Lithographic Technologies IX, R. S. Mackay, Ed.
    • V. B. Fleurov, P. C. Oh, T. D. Steiger, I. V. Fomenkov, W. N. Partlo, Development in Gas-Discharge Drive Lasers for LPP EUV Sources, in: Proc. SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 874-884 (2005).
    • (2005) Proc. SPIE , vol.5751 , pp. 874-884
    • Fleurov, V.B.1    Oh, P.C.2    Steiger, T.D.3    Fomenkov, I.V.4    Partlo, W.N.5
  • 4
    • 0000254510 scopus 로고    scopus 로고
    • Thermal stability of Mo/C/Si/C multilayer soft X-ray mirrors
    • H. Takenaka and T. Kawamura, Thermal Stability of Mo/C/Si/C Multilayer Soft X-ray Mirrors, J. of Elec. Spec, and Rel. Phenom., Vol. 80, 381-384 (1996).
    • (1996) J. of Elec. Spec, and Rel. Phenom. , vol.80 , pp. 381-384
    • Takenaka, H.1    Kawamura, T.2
  • 5
    • 0036614411 scopus 로고    scopus 로고
    • Mo/Si multilayers with different barrier layers for applications as EUV minors
    • St. Braun, H. Mai, M. Moss, R. Scholz, A. Leson, Mo/Si multilayers with different barrier layers for applications as EUV minors, Jpn. J. Appl. Phys. 41, 4074-4081 (2002).
    • (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 4074-4081
    • Braun, S.1    Mai, H.2    Moss, M.3    Scholz, R.4    Leson, A.5
  • 6
    • 0036614412 scopus 로고    scopus 로고
    • Damage resistant and low stress EUV multilayer mirrors
    • T. Feigl, S. Yulin, T. Kuhlmann, N. Kaiser, Damage resistant and low stress EUV multilayer mirrors, Jpn. J. Appl. Phys. Vol. 41, 4082-4085 (2002).
    • (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 4082-4085
    • Feigl, T.1    Yulin, S.2    Kuhlmann, T.3    Kaiser, N.4
  • 7
    • 32344438830 scopus 로고    scopus 로고
    • High-temperature stability multilayers for extreme-ultraviolet condenser optics
    • S. Bajt, D. G. Stearns, High-temperature stability multilayers for extreme-ultraviolet condenser optics, Appl. Opt., Vol. 44 (36), 7735-43 (2005).
    • (2005) Appl. Opt. , vol.44 , Issue.36 , pp. 7735-7743
    • Bajt, S.1    Stearns, D.G.2
  • 8
    • 24644508362 scopus 로고    scopus 로고
    • High-temperature multilayers
    • Emerging Lithographic Technologies IX, R. S. Mackay, Ed.
    • S. Yulin, N. Benoit, T. Feigl, N. Kaiser, High-temperature multilayers, in: Proc. SPIE Vol. 5751, Emerging Lithographic Technologies IX, R. S. Mackay, Ed., 1155-1161 (2005).
    • (2005) Proc. SPIE , vol.5751 , pp. 1155-1161
    • Yulin, S.1    Benoit, N.2    Feigl, T.3    Kaiser, N.4
  • 10
    • 0141501387 scopus 로고    scopus 로고
    • Characterization of the PTB EUV reflectometry facility for large EUVL optical components
    • Emerging Lithographic Technologies VII, R. L. Engelstad, Ed.
    • J. Tümmler, H. Blume, G. Brandt, J. Eden, B. Meyer, H. Scherr, F. Scholz, F. Scholze, G.Ulm, Characterization of the PTB EUV reflectometry facility for large EUVL optical components, in: Proc. SPIE Vol. 5037, Emerging Lithographic Technologies VII, R. L. Engelstad, Ed., 265-273 (2003).
    • (2003) Proc. SPIE , vol.5037 , pp. 265-273
    • Tümmler, J.1    Blume, H.2    Brandt, G.3    Eden, J.4    Meyer, B.5    Scherr, H.6    Scholz, F.7    Scholze, F.8    Ulm, G.9


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.