Interface-engineered EUV multilayer mirrors

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 692-694

  Yulin, Sergiy ^a   Benoit, Nicolas ^a   Feigl, Torsten ^a   Kaiser, Norbert ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

EUVL; High reflectivity and thermal stability; Mo Si interface engineered multilayers

Indexed keywords

DIFFUSION; LITHOGRAPHY; MOLYBDENUM; MULTILAYERS; OPTIMIZATION; ULTRAVIOLET RADIATION;

EUVL; HIGH REFLECTIVITY AND THERMAL STABILITY; MO/SI INTERFACE-ENGINEERED MULTILAYERS; MULTILAYER MIRRORS;

MIRRORS;

EID: 33646061664     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.126     Document Type: Article

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