Nitrogen plasma cleaning of Ge(1 0 0) surfaces

Applied Surface Science

Volumn 255, Issue 12, 2009, Pages 6335-6337

  Kutsuki, Katsuhiro ^a   Okamoto, Gaku ^a   Hosoi, Takuji ^a   Shimura, Takayoshi ^a   Watanabe, Heiji ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Ge MIS; Nitrogen plasma; Surface treatment

Indexed keywords

ALUMINUM NITRIDE; AUGER ELECTRON SPECTROSCOPY; CLEANING; ELECTRONS; GATE DIELECTRICS; GERMANIUM COMPOUNDS; PLASMA APPLICATIONS; SURFACE TREATMENT;

AUGER ELECTRON SPECTROSCOPIES (AES); C-N BOND FORMATIONS; CONTAMINATION-FREE; LOW SUBSTRATE TEMPERATURE; NITROGEN PLASMA TREATMENT; PLASMA NITRIDATION; REACTION MECHANISM; SURFACE CONTAMINATIONS;

NITROGEN PLASMA;

EID: 62449146693     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.02.011     Document Type: Article

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