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Volumn 76, Issue 20, 2000, Pages 2940-2942
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Controlling the concentration and position of nitrogen in ultrathin oxynitride films formed by using oxygen and nitrogen radicals
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0005488298
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.126523 Document Type: Article |
Times cited : (16)
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References (10)
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