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Applied Physics Letters

Volumn 91, Issue 16, 2007, Pages

Humidity-dependent stability of amorphous germanium nitrides fabricated by plasma nitridation

(5) Kutsuki, Katsuhiro a Okamoto, Gaku a Hosoi, Takuji a Shimura, Takayoshi a Watanabe, Heiji a

a OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR; ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; ELECTRIC INSULATORS; PASSIVATION; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS GERMANIUM NITRIDE (GE3 N4); HYDROXYL GROUPS; PASSIVATION LAYERS; PLASMA NITRIDATION;

SEMICONDUCTING GERMANIUM COMPOUNDS;

EID: 35548956402 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2799260 Document Type: Article

Times cited : (23)

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